Marvin Leuvrey is a photographer and artist based in Paris. His commercial work has led him to collaborate with brands such as Louis Vuitton,  Jacquemus, Dior, Hermès, Veilance, Givenchy, Loewe,  Moncler, Rapha, Salomon as well as editorials for magazines such as Epoch, Images, M magazine, Another Man, Revue, Wallpaper*, (RE)picture. Through his artistic work, Marvin was shortlisted for the FOAM Paul Huf Award (2018, 2019) and Mack First Book Award (2018). He presented his work in places such as the Benaki Museum in Athens, Fotomuseum Winterthur and Post Gallery in Tokyo. Initially inspired as a teenager by the seminal styles of cinematographers such as Robby Müller and Christopher Doyle, he later drifted into photography, getting to grips with the medium during his studies at ECAL in Switzerland. Coupled with his interests in future realities and mankind’s complex relationship with technology, he began shaping the thematic foundations of his practice. Using both analog and digital manipulation, 3D or video, his work brings together various ways of making an image. It merges authentic and virtual reality,into abstract and yet familiar frames.
Clients includes: Jacquemus, Dior, Hermès, Veilance, Givenchy, Loewe,  Moncler, Rapha, Salomon , Margiela, Kenzo, Alyx, OK-RM, Stella McCartney, Virgil Abloh, Montblanc, Distance, Saint-Louis, John Lobb, Mr Porter, Bruther, MCA Chicago, Kwaidan, Vico Magistretti  Magazines: Epoch, Images, M magazine, Another Man, Revue, Wallpaper*, (RE)picture, Mold Magazine, Harper Bazaar Japan, AD, L’Express diX, Klima Magazine, L’Officiel Paris, Novembre Magazine, Le Temps.